This article provides a practical overview of energy-dispersive spectroscopy (EDS) and its various uses in semiconductor device manufacturing and failure analysis. It explains how EDS techniques are typically implemented, compares and contrasts different methods, and discusses the factors that determine spatial and energy resolution, measurement depth, sensitivity, signal-to-noise ratio, and ease of use.

elemental analysis, energy dispersive spectroscopy, energy resolution, SEM-EDS, spatial resolution, TEM-EDS, X-ray detector
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Copyright © ASM International® 2011
2011
ASM International
Topics
X-ray detectors Semiconductor wafer fabrication Energy dispersive X-ray spectroscopy
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