This article discusses the development of resonance-enhanced AFM-IR spectroscopy and demonstrates its effectiveness on silicon test wafers with nanoscale skin particles and polyester contaminants.

nanoscale chemical imaging, organic contaminants, resonance-enhanced AFM-IR spectroscopy
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Copyright © ASM International® 2017
2017
ASM International
Topics
Atomic force microscopy Semiconductor wafer fabrication Gas chromatography/infrared spectroscopy
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